Qhov sib txawv tseem ceeb ntawm PVD thiab CVD yog tias cov khoom siv txheej hauv PVD yog nyob rau hauv cov ntaub ntawv uas nyob rau hauv CVD nws yog nyob rau hauv gaseous daim ntawv.
PVD thiab CVD yog txheej txheej txheej, uas peb tuaj yeem siv los tso cov yeeb yaj kiab nyias ntawm ntau lub substrates. Txheej ntawm substrate yog ib qho tseem ceeb nyob rau ntau zaus. Txheej tuaj yeem txhim kho kev ua haujlwm ntawm substrate; qhia txog kev ua haujlwm tshiab rau lub substrate, tiv thaiv nws los ntawm kev puas tsuaj sab nraud, thiab lwm yam yog li cov txheej txheem tseem ceeb. Txawm hais tias ob qho tib si txheej txheem qhia cov txheej txheem zoo sib xws, muaj qee qhov sib txawv ntawm PVD thiab CVD; Yog li ntawd, lawv muaj txiaj ntsig zoo hauv ntau zaus.
PVD yog dab tsi?
PVD yog lub cev vapor deposition. Nws yog feem ntau yog vaporisation txheej txheej txheem. Cov txheej txheem no muaj ob peb kauj ruam. Txawm li cas los xij, peb ua tag nrho cov txheej txheem hauv lub tshuab nqus tsev. Ua ntej, cov khoom precursor yog bombarded nrog ib tug beam ntawm electrons, thiaj li hais tias nws yuav muab atoms ntawm cov khoom.
Daim duab 01: PVD Apparatus
Secondly, cov atoms ces nkag mus rau lub reacting chamber uas lub txheej substrate muaj. Nyob ntawd, thaum thauj, cov atoms tuaj yeem hnov mob nrog lwm cov roj los tsim cov khoom siv txheej lossis cov atoms lawv tus kheej tuaj yeem ua cov khoom siv txheej. Thaum kawg, lawv tso rau ntawm lub substrate ua ib lub tsho nyias nyias. PVD txheej yog qhov tseem ceeb hauv kev txo qis kev sib txhuam, lossis txhawm rau txhim kho oxidation tsis kam ntawm cov khoom lossis txhim kho cov tawv tawv, thiab lwm yam.
CVD yog dab tsi?
CVD yog tshuaj vapor deposition. Nws yog ib txoj hauv kev tso cov khoom thiab tsim ib zaj duab xis nyias los ntawm cov khoom siv roj. Txawm hais tias txoj kev no zoo ib yam li PVD, muaj qee qhov sib txawv ntawm PVD thiab CVD. Ntxiv mus, muaj ntau hom CVD xws li laser CVD, photochemical CVD, low-pressure CVD, hlau organic CVD, thiab lwm yam.
Nyob hauv CVD, peb yog txheej txheej ntawm cov khoom siv substrate. Txhawm rau ua qhov txheej txheem no, peb yuav tsum xa cov khoom txheej rau hauv cov tshuaj tiv thaiv chamber nyob rau hauv daim ntawv ntawm vapor ntawm qhov kub thiab txias. Nyob ntawd, cov roj reacts nrog lub substrate, los yog nws decomposes thiab deposits ntawm lub substrate. Yog li ntawd, nyob rau hauv ib tug CVD apparatus, peb yuav tsum muaj ib tug gas xa system, reacting chamber, substrate loading mechanism thiab ib lub zog muab.
Tsis tas li ntawd, cov tshuaj tiv thaiv tshwm sim hauv lub tshuab nqus tsev kom paub tseeb tias tsis muaj cov pa roj ntxiv dua li cov pa tawm. Qhov tseem ceeb tshaj, qhov kub ntawm lub substrate yog qhov tseem ceeb rau kev txiav txim siab qhov tso tawm; Yog li, peb xav tau ib txoj hauv kev los tswj qhov kub thiab txias hauv lub cuab yeej.
Daim duab 02: A Plasma Assisted CVD Apparatus
Thaum kawg, lub cuab yeej yuav tsum muaj txoj hauv kev kom tshem tawm cov khib nyiab ntau dhau. Peb yuav tsum xaiv cov khoom uas tsis muaj tshuaj lom. Ib yam li ntawd, nws yuav tsum ruaj khov; Tom qab ntawd peb tuaj yeem hloov nws mus rau theem gaseous thiab tom qab ntawd txheej rau hauv substrate. Hydrides zoo li SiH4, GeH4, NH3, halides, hlau carbonyls, hlau alkyls, thiab hlau alkoxides yog ib co ntawm cov precursors. Cov txheej txheem CVD muaj txiaj ntsig zoo hauv kev tsim cov coatings, semiconductors, composites, nanomachine, optical fibers, catalysts, thiab lwm yam.
Qhov txawv ntawm PVD thiab CVD yog dab tsi?
PVD thiab CVD yog txheej txheem txheej txheem. PVD stands rau lub cev vapor deposition thaum CVD stands rau tshuaj vapor deposition. Qhov sib txawv tseem ceeb ntawm PVD thiab CVD yog tias cov khoom siv txheej hauv PVD yog nyob rau hauv cov ntaub ntawv uas nyob rau hauv CVD nws yog nyob rau hauv gaseous daim ntawv. Raws li lwm qhov sib txawv tseem ceeb ntawm PVD thiab CVD, peb tuaj yeem hais tias nyob rau hauv PVD txheej txheem atoms tsiv thiab tso rau ntawm lub substrate thaum nyob rau hauv CVD txheej txheem cov gaseous molecules yuav hnov nrog lub substrate.
Ntxiv mus, muaj qhov sib txawv ntawm PVD thiab CVD nyob rau hauv qhov kub thiab txias deposition ib yam. Qhov ntawd yog; rau PVD, nws tso rau ntawm qhov kub thiab txias (ib ncig ntawm 250 ° C ~ 450 ° C) whereas, rau CVD, nws tso rau ntawm qhov kub thiab txias nyob rau hauv thaj tsam ntawm 450 ° C txog 1050 ° C.
Summary – PVD vs CVD
PVD sawv cev rau lub cev vapor deposition thaum CVD sawv cev rau cov tshuaj vapor deposition. Ob leeg yog txheej txheej txheej. Qhov sib txawv tseem ceeb ntawm PVD thiab CVD yog tias cov khoom txheej hauv PVD yog nyob rau hauv cov ntaub ntawv uas nyob rau hauv CVD nws yog nyob rau hauv gaseous daim ntawv.
